X-ray Photoelectron Spectroscopy (XPS)

XPS analysis is a non-destructive, surface-sensitive quantitative spectroscopic technique that typically measures the top 0-10 nm of a sample surface. Conducted under ultra-high vacuum, XPS is used to analyze the surface chemical composition, measuring both the elemental composition and the chemical states of atoms within the material. Besides single-point measurements, XPS allows for line profiling, mapping and depth profiling across the surface, providing detailed insights into the materials surface chemistry.